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    Efficient Ab Initio Calculations of Electron-Defect Scattering and Defect-Limited Carrier Mobility

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    Electron-defect (ee-d) interactions govern charge carrier dynamics at low temperature, where they limit the carrier mobility and give rise to phenomena of broad relevance in condensed matter physics. Ab initio calculations of ee-d interactions are still in their infancy, mainly because they require large supercells and computationally expensive workflows. Here we develop an efficient ab initio approach for computing elastic ee-d interactions, their associated ee-d relaxation times (RTs), and the low-temperature defect-limited carrier mobility. The method is applied to silicon with simple neutral defects, such as vacancies and interstitials. Contrary to conventional wisdom, the computed ee-d RTs depend strongly on carrier energy and defect type, and the defect-limited mobility is temperature dependent. These results highlight the shortcomings of widely employed heuristic models of ee-d interactions in materials. Our method opens new avenues for studying ee-d scattering and low-temperature charge transport from first principles.Comment: 11 pages, 5 figures, submitte
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